GaAs, VGF Grown (110) ori. N type, Si-doped, 10x10x0.3mm, 2sp Thin-Film/Flexible Battery and Lock clamps

and Lock clamps

< 5 o   +/- 1o

Click the video below to see how to heat sealing the tab onto pouch cell case after the welding:

Coating thickness: ~143 um

Surface Density: 180±15g/m²

GaAs, VGF Grown (110) ori. N type, Si-doped, 10x10x0.3mm, 2sp Thin-Film/Flexible Battery and Lock clampsGaAs single crystal wafer Growing Method: VGF Orientation: (110) Size: 10 x 10 x 0. 3 0. 35 mm Polishing: Two sides polished Doping: Si doped Conductor type: S C N Carrier Concentration:(2. 49 3. 27)x10^18 c. c Mobility: 1630 1870cm^2 V. S Resistivity :( 1. 17 1. 4)x10^ 3 ohm. cm Ra(Average Roughness) : < 0. 4 nm Related Products Other GaAs InSb Other InAs InP GaSb Wafer Box Film Coater RTP Furnaces