Boron Nitride Film on Silicon Wafer, 24 nm / 4" -- BN-Si-100-24nm - FmBNonSia100D0525C1FT24nm Crushers & Grinders The installation can be completed

The installation can be completed within 10minutes without the use of special tools or welds

Mohn hardness

Positive Temperature Coefficient (PTC) Thermistor is built into the cap for overcurrent protection

Hardness: 9 (mohs)

Surface Roughness: < 50 microns

Boron Nitride Film on Silicon Wafer, 24 nm / 4" -- BN-Si-100-24nm - FmBNonSia100D0525C1FT24nm Crushers & Grinders The installation can be completedBoron Nitride Film Boron nitride is a chemical compound with the chemical formula BN, consisting of equal numbers of boron and nitrogen atoms. BN film is amorphous t Its hardness is inferior only to diamond, but its thermal and chemical stability is superior. Low pressure deposition of thin films of boron nitride is grown on Si (100) wafers for this product by sputtering BN Film coated by sputtering method The amorphous structure ( no orientation)