M05600 - SEMI M56 - Practice for Determining Cost Components for Metrology Equipment Due to Measurement Variability and Bias StdVol-Process Chemicals associated support equipment and facilities

associated support equipment and facilities infrastructure equipment function within acceptable ranges

which is used in the semiconductor industry for the deposition of tantalum nitride based layers by atomic layer deposition

• edge roundness

This Test Method is suitable quantifying the near edge geometry of wafers used in semiconductor device processing

This Document covers requirements for helium used in the semiconductor industry

M05600 - SEMI M56 - Practice for Determining Cost Components for Metrology Equipment Due to Measurement Variability and Bias StdVol-Process Chemicals associated support equipment and facilitiesThis Practice covers a methodology to determine the costs associated with misclassification of product due to variability and bias of measurement equipment. These costs are associated with failing product that conforms with specifications and passing product that does not conform with specifications. This Practice can be applied to make relative cost comparisons between two or more measurement gauges operating under conditions specified by the user.