G00300 - SEMI G3 - 仕様　側面ろう付け積層板 Revision:SEMI G3-90 - Inactive SEMI MF1152-0305 (Reapproved 0211)

SEMI MF1152-0305 (Reapproved 0211)

SEMI G59 — Test Method for Measurement of Ionic Contamination on Leadframe Interleafing and the Contamination Transferred from the Interleafing to the Leadframes

本文書の目的は，半導体産業で使用されるシラン(SiH4)の仕様を提供するものである。

SEMI MF1723 –– Practice for Evaluation of Polycrystalline Silicon Rods by Float-zone Crystal Growth and Spectroscopy

previously published November 2003

G00300 - SEMI G3 - 仕様　側面ろう付け積層板 Revision:SEMI G3-90 - Inactive SEMI MF1152-0305 (Reapproved 0211)CurrentInactiveInactiveSEMI 7. 62 mm (0. 003 in.)10. 16 mm (0. 400 in.)15. 24 mm (0. 600 in.)22. 86 mm (0. 900 in.) Referenced SEMI Standards None.