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E01600 - SEMI E16 - マスフローコントローラ漏洩率の決定および記述のガイド StdVol-Automation Technology SEMI S5-1121 (technical revision)
E01600 - SEMI E16 - マスフローコントローラ漏洩率の決定および記述のガイド StdVol-Automation Technology SEMI S5-1121 (technical revision)
$115.50
Description
SEMI S5-1121 (technical revision)
org in February 2010
SEMI E70-1213 (technical revision)
This Practice is intended for use with all silicon wafer sizes and types when measuring uniformity of film properties and characteristics
This Test Method is especially applicable for silicon where boron is an unintentional p-type contaminant at trace levels (<5 × 1014 atoms/cm3)
E01600 - SEMI E16 - マスフローコントローラ漏洩率の決定および記述のガイド StdVol-Automation Technology SEMI S5-1121 (technical revision)global Gases Committee2011513global Audits and Reviews Subcommittee20116www. semiviews. org www. semi. org1990200411 (MFCs) Referenced SEMI Standards None.
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