E18300 - SEMI E183 - Specification for Rich Interactive Test Database (RITdb) Revision:SEMI E183-0123 - Current high throughput in-line method for

high throughput in-line method for measuring wafer thickness and its total variation using laser triangulation sensors

•Identify the various processes involved in laminate manufacturing

1  Introduction

org in November 2013

SEMI MF42-02 (first SEMI publication)

E18300 - SEMI E183 - Specification for Rich Interactive Test Database (RITdb) Revision:SEMI E183-0123 - Current high throughput in-line method forThis Specification describes a data and event sharing and streaming methodology for semiconductor test and related operations. The scheme fully supports legacy equipment and allows equipment vendors the flexibility to provide additional data items via extensions. Real time, historical, and widely distributed data are fully supported. Provenance of all data is supported via customizable metadata along with cryptographic hashing and signing.