M04900 - SEMI M49 - 130 nmから65 nmへの技術世代のシリコンウェーハ用ジオメトリ測定システム規定のためのガイド StdVol-Facilities This Specification covers the special

This Specification covers the special requirements for metal strip to be used to fabricate integrated circuit leadframes by etching

The Specification of which data items are optional and which are required is not specified in this Document

This standard was technically approved by the Global Micropatterning Committee and is the direct responsibility of the North American Micropatterning Committee

those defined in ANSI/ESD S20

SEMI MF673-1014 (technical revision)

M04900 - SEMI M49 - 130 nmから65 nmへの技術世代のシリコンウェーハ用ジオメトリ測定システム規定のためのガイド StdVol-Facilities This Specification covers the specialInternational Technology Roadmap for Semiconductors 1999 edition ITRS1309065 nmSEMI M1SEMI M8SEMI M11SEMI M24SEMI M38 Referenced SEMI Standards SEMI E1. 9 Mechanical Specification for Cassettes Used to Transport and Store 300 mm WafersSEMI E5 Specification for SEMI Equipment Communications Standard 2 Message Content (SECS II)SEMI E10 Specification for Definition and Measurement of Equipment Reliability, Availability, and Maintainability (RAM) and