D08400 - SEMI D84 - Terminology for FPD Phase Shift Mask and Mask Blanks StdPbc-1217 1 This Specification describes a

1  This Specification describes a method for data acquisition EDA Applications to request process and data from equipment to be communicated in an automated fashion by the equipment

Arizona’s semiconductor ecosystem is at an inflection point—poised to transform rapid growth into sustainable global leadership

This Specification provides information for developing specifications for silicon annealed wafers used to fabricate semiconductor devices and integrated circuits

It was formally approved by ASTM balloting procedures and adhered to ASTM patent requirements

The purpose of this Safety Guideline is to provide information and methods related to flow limiting devices (FLDs) that limit the rate of release of hazardous gases during transportation

D08400 - SEMI D84 - Terminology for FPD Phase Shift Mask and Mask Blanks StdPbc-1217 1 This Specification describes aThis Standard defines the terminology for FPD phase shift masks and mask blanks. This Standard applies to phase shift masks and mask blanks that are principally used in fabricating flat panel displays. Referenced SEMI Standards (purchase separately) None. Revision History SEMI D84 0823 (first published)